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INTERNATIONAL PATENT: ENEOS MATERIALS CORPORATION, 株式会社ENEOSマテリアル FILES APPLICATION FOR "RUBBER COMPOSITION AND TIRE"

GENEVA, March 3 -- ENEOS MATERIALS CORPORATION (5-2, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057109), 株式会社ENEOSマテ&#1252... और पढ़ें


INTERNATIONAL PATENT: NTT DOCOMO, INC., 株式会社NTTドコモ FILES APPLICATION FOR "TERMINAL, BASE STATION, RADIO COMMUNICATION SYSTEM AND RADIO COMMUNICATION METHOD"

GENEVA, March 3 -- NTT DOCOMO, INC. (11-1, Nagatacho 2-chome, Chiyoda-ku, Tokyo1006150), 株式会社NTTドコモ (東京都&#213... और पढ़ें


INTERNATIONAL PATENT: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD., パナソニックIPマネジメント株式会社 FILES APPLICATION FOR "SPEAKER SYSTEM"

GENEVA, March 3 -- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (22-6, Moto-machi, Kadoma-shi, Osaka5710057), パナソニックIPマネ&#... और पढ़ें


INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "SEMICONDUCTOR MANUFACTURING DEVICE AND TEMPERATURE ADJUSTMENT METHOD"

GENEVA, March 3 -- TOKYO ELECTRON LIMITED (3-1, Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東&#2... और पढ़ें


INTERNATIONAL PATENT: NTT DOCOMO, INC., 株式会社NTTドコモ FILES APPLICATION FOR "TERMINAL, WIRELESS COMMUNICATION METHOD AND BASE STATION"

GENEVA, March 3 -- NTT DOCOMO, INC. (11-1,Nagatacho 2-chome, Chiyoda-ku, Tokyo1006150), 株式会社NTTドコモ (東京都&#2131... और पढ़ें


INTERNATIONAL PATENT: JSR CORPORATION, JSR株式会社 FILES APPLICATION FOR "COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND METHOD FOR PRODUCING NITROGEN-CONTAINING COMPOUND"

GENEVA, March 3 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), JSR株式会社 (東京都港区東... और पढ़ें


INTERNATIONAL PATENT: SEIKO KOGYO CO., LTD., 株式会社成光工業 FILES APPLICATION FOR "NATURAL NAIL PRIMER COMPOSITION, METHOD FOR PEELING NAIL FROM NATURAL NAIL AND SET COMPRISING AT LEAST NATURAL NAIL PRIMER COMPOSITION"

GENEVA, March 3 -- SEIKO KOGYO CO., LTD. (6-7, Asano-cho, Kawasaki-ku, Kawasaki-shi, Kanagawa2100854), 株式会社成光工業 (神奈川&#30476... और पढ़ें


INTERNATIONAL PATENT: AGC INC., AGC株式会社 FILES APPLICATION FOR "METHOD FOR CORRECTING SHAPE OF POLISHING PAD AND WORKPIECE POLISHED BY USING SAID METHOD"

GENEVA, March 3 -- AGC INC. (5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008405), AGC株式会社 (東京都千代田区&#200... और पढ़ें


INTERNATIONAL PATENT: KANAZAWA MEDICAL UNIVERSITY, 学校法人金沢医科大学 FILES APPLICATION FOR "EMBRYO ACQUISITION METHOD"

GENEVA, March 3 -- KANAZAWA MEDICAL UNIVERSITY (1-1, Daigaku, Uchinada-machi, Kahoku-gun, Ishikawa9200293), 学校法人金沢医科大学 (石&#... और पढ़ें


INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "STATE DETERMINATION DEVICE, STATE DETERMINATION METHOD AND STATE DETERMINATION PROGRAM"

GENEVA, March 3 -- TOKYO ELECTRON LIMITED (3-1, Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東&#2... और पढ़ें